Advanced Lithography
Hardback or Cased Book 260 pages Feb 09, 2015
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This book presents state-of-the-art information regarding the extensive field of advanced lithography. Advanced lithography expands into numerous sub-fields like micro electro-mechanical system (MEMS), nano-lithography, nano-physics, etc. In optimized electron device, nano-lithography reaches up to 20 nm in size. Subsequently, we have to analyze and develop true single nanometer size lithography. One of the solutions is to analyze a fusion of bottom up and top down technologies like EB drawing and self-assembly with block copolymer. In nano-photonics and MEMS, 3D structures are required for carrying out specific functions in the devices for applications. They are formed as a result of execution of numerous techniques like stereo-lithography, sputtering, colloid lithography, deposition, dry etching, etc. This book provides the readers with valuable information about nano structure, 3D structure, nano-lithography, and elucidates the methodology, techniques and applications of nano-lithography.
- Author:
- Burton Kohler
- Publisher:
- NY Research Press
- Publication Date:
- Feb 09, 2015
- Number of pages:
- 260 pages
- Binding:
- Hardback or Cased Book
- ISBN-10:
- 1632380161
- ISBN-13:
- 9781632380166